Advances in Chemical Mechanical Planarization CMP

  • Author : Suryadevara Babu
  • Publsiher : Woodhead Publishing
  • Release : 09 January 2016
  • ISBN : 9780081002186
  • Page : 536 pages
  • Rating : 4/5 from 1 voters

Download or read online book entitled Advances in Chemical Mechanical Planarization CMP written by Suryadevara Babu and published by Woodhead Publishing. This book was released on 09 January 2016 with total page 536 pages. Available in PDF, EPUB and Kindle. Get best books that you want by click Get Book Button and Read as many books as you like. Book Excerpt : Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. Considers techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for particular materials Addresses consumables and process control for improved CMP

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP
Author: Suryadevara Babu
Publisher: Woodhead Publishing
Relase: 2016-01-09
ISBN: 9780081002186
GET BOOK

Advances in Chemical Mechanical Polishing Volume 816

Advances in Chemical Mechanical Polishing  Volume 816
Author: Materials Research Society. Meeting
Publisher: Unknown
Relase: 2004-09
ISBN: UOM:39015059125883
GET BOOK

Colloidal Aspects of Chemical Mechanical Planarization CMP

Colloidal Aspects of Chemical Mechanical Planarization  CMP
Author: Tanuja Danie Gopal
Publisher: Unknown
Relase: 2004
ISBN: UCSD:31822009435025
GET BOOK

Advances in Tribology

Advances in Tribology
Author: Pranav H. Darji
Publisher: Unknown
Relase: 2016-10-26
ISBN: 9789535127420
GET BOOK

Chemical Mechanical Planarization Volume 767

Chemical Mechanical Planarization  Volume 767
Author: Duane S. Boning,Katia Devriendt,Michael R. Oliver,David J. Stein,Ingrid Vos
Publisher: Mrs Proceedings
Relase: 2003-08-27
ISBN: UOM:39015059971484
GET BOOK

Advances in Abrasive Technology

Advances in Abrasive Technology
Author: Anonim
Publisher: Unknown
Relase: 2007
ISBN: UOM:39015058919492
GET BOOK

Advances in Machining Manufacturing Technology VIII

Advances in Machining   Manufacturing Technology VIII
Author: Zhejun Yuan
Publisher: Trans Tech Publication
Relase: 2006
ISBN: PSU:000058480496
GET BOOK

Advances in Chemical Material and Metallurgical Engineering

Advances in Chemical  Material and Metallurgical Engineering
Author: Jian Min Zeng,Hong Xi Zhu,Jian Yi Kong
Publisher: Trans Tech Publications Ltd
Relase: 2013-01-11
ISBN: 9783038139706
GET BOOK

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization
Author: Robin Veronica Ihnfeldt
Publisher: Unknown
Relase: 2005
ISBN: UCSD:31822009463555
GET BOOK

Advances in Abrasive Processes

Advances in Abrasive Processes
Author: Xipeng Xu,Jianyun Shen,Yuan Li
Publisher: Trans Tech Publication
Relase: 2001
ISBN: UOM:39015051307117
GET BOOK

Chemical mechanical Polishing

Chemical mechanical Polishing
Author: Anonim
Publisher: Unknown
Relase: 2001
ISBN: UOM:39015048290418
GET BOOK

Chemical mechanical polishing 2001

Chemical mechanical polishing 2001
Author: Materials Research Society. Meeting
Publisher: Cambridge Univ Pr
Relase: 2001-12-14
ISBN: UCSD:31822031068034
GET BOOK

Advances in Resist Technology and Processing

Advances in Resist Technology and Processing
Author: Anonim
Publisher: Unknown
Relase: 2006
ISBN: UOM:39015058747521
GET BOOK

15th Wear of Materials

15th Wear of Materials
Author: P Blau,Steven L. Shaffer
Publisher: Elsevier
Relase: 2005-10-17
ISBN: 0080447368
GET BOOK

Oxygen Compounds Advances in Research and Application 2013 Edition

Oxygen Compounds   Advances in Research and Application  2013 Edition
Author: Anonim
Publisher: ScholarlyEditions
Relase: 2013-06-21
ISBN: 9781481678711
GET BOOK